Laboratory PECVD system (approx. CNY 1 million) for silicon-based thin-film deposition and materials research. Modular design and flexible customization support a broad range of R&D applications.
Electron-beam lithography (EBE) system for high-precision micro- and nanofabrication of patterned structures, widely used in semiconductors, MEMS, and nanomaterials.
Reactive ion etching (RIE) system for anisotropic material processing via plasma chemistry and physical ion bombardment. Gas delivery, RF power, and vacuum subsystems enable precise control of etch chemistry, ion energy, and density.
Used primarily for organic material growth and device annealing processes.
Cary 5000 UV-Vis-NIR spectrophotometer with excellent photometric performance from 190 to 3300 nm, making it a powerful tool for materials research. The enlarged sample compartment accommodates large accessories and integrating spheres for transmission and diffuse-reflectance measurements. A locking mechanism enables rapid accessory exchange and reproducible positioning.